Low temperature catalytic high temperature denitrification purification system

This purification system uses a self-made patented catalyst, which has a long service life, high purification depth, and strong instantaneous fluctuation ability of antigen feed gas; By using physical adsorption and chemical reaction processes, a large amount of impurities H2O, O2, CO, and CO2 in inert gas and hydrogen (H2) are first removed at room temperature. Then, residual impurities and N2 are removed through a high-temperature suction tower to reduce the impurities in the outlet pure gas to below 1 ppb. This device has the characteristics of long service life and simple operation.

Product Performance

Suitable for use with raw gas with a purity of not less than 99.999%.

This product has a dual structure, with one set for operation and the other set for regeneration and backup

◎ High purification depth, with export impurities content<1ppb

Electrochemical polishing of 316 (L) stainless steel

Built in 0.003 micron high-efficiency filter

This purifier is equipped with a pre purification tower to remove a large amount of impurities before the expensive consumable absorber tower, which can extend the service life of the expensive consumable absorber

Product application

High purity monocrystalline silicon, wafer epitaxy, large-scale integrated circuits, optoelectronic product production and other electronic industry gas terminal purification

◎ Semiconductor process equipment: CVD, MOCVD, HVPE, diffusion furnace, etc

◎ Bulk gas purification

system parameter